Chris Walton is a materials scientist in the Condensed Matter and Materials Division. His areas of expertise are thin film deposition, optical thin films, multilayer thin films, x-ray optics, ultraclean/low-particle film deposition, and multiphysics deposition simulation. Chris joined LLNL in 1998.
Dr. Walton's main project work has been:
- Precision film thickness control – depositing films with custom thickness profiles on curved optics, using programmed motion of the optic across the deposition source
- Low-defect deposition – depositing multilayer films with very low defect particle counts; detection and characterization of particles using laser light scatter, atomic-force microscopy (AFM) and scanning electron microscopy (SEM), and experiments and simulation to track movement of defect particles during the deposition process
- Film stress control – experiments and modeling on sources of intrinsic stress in sputtered films
- Multiphysics modeling of magnetron sputter deposition – simulation of film deposition using established physics models of the 4 main process steps: plasma, ion-target impact, sputtered-atom propagation, and film deposition
Dr. Walton is co-inventor on 5 US Patents and 3 R&D 100 awards.