Lawrence Livermore National Laboratory



Chris Walton

Materials Scientist
Materials Science Division


 +1 925-423-2834


DegreeDiscipline/InstitutionYear
Ph.D. Materials Science
University of California at Berkeley
1997
M.S. Materials Science
University of California at Berkeley
1992
B.S. Materials Science and Engineering
Massachusetts Institute of Technology
1990

Chris Walton is a materials scientist in the Condensed Matter and Materials Division. His areas of expertise are thin film deposition, optical thin films, multilayer thin films, x-ray optics, ultraclean/low-particle film deposition, and multiphysics deposition simulation. Chris joined LLNL in 1998.

Dr. Walton's main project work has been:

  1. Precision film thickness control – depositing films with custom thickness profiles on curved optics, using programmed motion of the optic across the deposition source
  2. Low-defect deposition – depositing multilayer films with very low defect particle counts; detection and characterization of particles using laser light scatter, atomic-force microscopy (AFM) and scanning electron microscopy (SEM), and experiments and simulation to track movement of defect particles during the deposition process
  3. Film stress control – experiments and modeling on sources of intrinsic stress in sputtered films
  4. Multiphysics modeling of magnetron sputter deposition – simulation of film deposition using established physics models of the 4 main process steps: plasma, ion-target impact, sputtered-atom propagation, and film deposition

Dr. Walton is co-inventor on 5 US Patents and 3 R&D 100 awards.

Online documents

www.euvlitho.com/2010/Optics-1.pdf 

https://www-eng.llnl.gov/mod_sim/mod_sim_sputter.html 

Selected Publications

  1. C. C. Walton, G. Thomas, and J. B. Kortright, "X-ray optical multilayers: Microstructure limits on reflectivity at ultra-short periods," Acta Materialia 46, 3767-3775 (1998).
  2. C. C. Walton, P. A. Kearney, P. B. Mirkarimi, J. M. Bowers, C. J. Cerjan, A. L. Warrick, K. C. Wilhelmsen, E. R. Fought, C. E. Moore, C. Larson, S. L. Baker, S. C. Burkhart, and S. D. Hector, "Extreme ultraviolet lithography-reflective mask technology," SPIE-Int. Soc. Opt. Eng. Proceedings of the SPIE - The International Society for Optical Engineering 3997, 496-507 (2000).
  3. C. C. Walton, P. A. Kearney, J. A. Folta, D. L. Sweeney, and P. B. Mirkarimi, "Understanding particle defect transport in an ultra-clean sputter coating process," Proc. SPIE 5037, 470 (2003).
  4. A. F. Jankowski, Saw, C. K, Walton, C. C. Hayes, J. P. Nilsen, J, "Boron–carbide barrier layers in scandium–silicon multilayers," Thin Solid Films 469-470, 372-376 (2004).
  5. C. C. Walton, G. H. Gilmer, L. A. Zepeda-Ruiz, M. J. McNenly, J. P. Verboncoeur, S. C. Wilks, and T. W. Barbee, "Virtual Sputter Chamber - Multiphysics Simulation of Magnetron Sputter and Deposition," in EUV Litho Workshop, http://www.euvlitho.com/2010/Optics-1.pdf (2010).

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